Extreme
Ultraviolet Lithography (EUVL) Equipment Market Size and Growth Rate:
As per the latest reports published by
Research Cosmos, Extreme Ultraviolet Lithography (EUVL) Equipment Market is
poised to touch USD 1.96 billion by 2023 growing at a CAGR of 9.3% by 2022.
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details of 140 number of pages research report developed on Extreme Ultraviolet
Lithography (EUVL) Equipment Market @
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Extreme
Ultraviolet Lithography (EUVL) Equipment Market Overview:
Extreme
Ultraviolet Lithography (EUVL) Equipment Market is the
next-generation lithography technology that uses the smaller wavelengths to
create circuits with small features and obtains a better resolution output.
Lithography is used to print complex patterns in semiconductor wafers that
define integrated circuits. EUV Lithography is one of the latest generations in
Lithographic Technologies. Plasma produced by discharge and plasma produced by
laser are key technologies used to produce high energy radiation.
Extreme
Ultraviolet Lithography (EUVL) Equipment Market Growth Drivers and Restraints:
It is expected that global Extreme Ultraviolet Lithography Equipment
Market will be witness considerable growth rates during the forecast
period due to an increase in miniaturization and refinement of elements of the
electronic circuit. The state-of-the-art EUV lithography systems allow
customers to manufacture smaller, faster and more powerful chips that require
maximum lithography. In addition, conventional argon fluoride techniques
require expensive multi-modeling masks. This technology requires up to four
masks to create a layer of silicon wafer, but EUV lithography only requires a
mask to create the layer. This factor is expected to expand the market over the
next few years.
However, due to the high cost of extreme
ultraviolet lithography equipment, the market faces some difficulties. This
high cost is due to the advanced, complex and unique features of the equipment,
as it uses extremely short wavelengths. It is expected that the increased use
of extreme ultraviolet lithography and masking layers in the semiconductor
industry compared to argon fluoride immersion techniques will provide
significant opportunities in the global market in the near future.
Geographical
Analysis of Extreme Ultraviolet Lithography (EUVL) Equipment Market:
Geographically, the world market is segmented
as Asia Pacific, Middle East and Africa, South America, North America, Europe
and Asia. With regard to income, the Asia Pacific region occupies the first
place in the global market. The market in this region is expected to grow at an
average annual growth rate of 28.6% in the forecast period. With the arrival of
a large number of semiconductor companies in the Asia-Pacific region, extreme
ultraviolet lithography has been adopted.
With the high use of semiconductor devices
such as memories in the Asia-Pacific region, Korea accounts for a large part of
the profit margin of the ultra-violet lithography market followed by Taiwan. In
addition, it is expected that the growth of the semiconductor industry in the
Japanese market will greatly increase the CAGR during the forecast period.
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Key
Players of Extreme Ultraviolet Lithography (EUVL) Equipment Market:
The main companies in the global Extreme Ultraviolet Lithography (EUVL)
Equipment Market include Intel Corporation, ASML Holding, Samsung
Electronics, Canon, Nikon, Taiwan Semiconductor Manufacturing Company Limited
(TSMC) and Carl Zeiss AG.
Extreme
Ultraviolet Lithography (EUVL) Equipment Market Segmentation:
By Light
Source:
·
Laser Produced Plasmas (LPP)
·
Vacuum Sparks
·
Gas Discharges
By
Equipment:
·
Light Source
·
Mirrors
·
Mask
By
Application:
·
Memory
·
IDM
·
Foundry
By Region:
·
North America
·
South America
·
Europe
·
Asia Pacific
·
Middle East and Africa
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